[1]廖华,胡昕,杨勤劳,等.大面积高分辨率CsI(Tl) X射线转换屏实验研究[J].深圳大学学报理工版,2014,31(2):174-178.[doi:10.3724/SP.J.1249.2014.02174]
 Liao Hua,Hu Xin,Yang Qinlao,et al.Experimental study on an X-ray CsI(Tl) converting screen with large format and high spatial resolution[J].Journal of Shenzhen University Science and Engineering,2014,31(2):174-178.[doi:10.3724/SP.J.1249.2014.02174]
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大面积高分辨率CsI(Tl) X射线转换屏实验研究()
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《深圳大学学报理工版》[ISSN:1000-2618/CN:44-1401/N]

卷:
第31卷
期数:
2014年第2期
页码:
174-178
栏目:
光电工程
出版日期:
2014-03-20

文章信息/Info

Title:
Experimental study on an X-ray CsI(Tl) converting screen with large format and high spatial resolution
文章编号:
20140211
作者:
廖华1胡昕2杨勤劳1王光超1王云程1阔晓梅1
1) 深圳大学光电子器件与系统教育部重点实验室,光电子学研究所,深圳518060;
2) 中国工程物理研究院激光聚变研究中心,四川 绵阳 621900
Author(s):
Liao Hua1 Hu Xin2 Yang Qinlao1 Wang Guangchao1 Wang Yuncheng1 and Kuo Xiaomei1
1) Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education, Institute of Optoelectronics, Shenzhen University, Shenzhen 518060, P.R.China
2) Research Center of Laser Fusion, China Academy of Engineering Physical, Mianyang 621900, Sichuan Province, P.R.China
关键词:
数字成像掺杂浓度基底刻蚀晶柱生长空间分辨X射线转换屏
Keywords:
digital imaging doping concentration etching substrate growing crystal columns spatial resolution X-ray converting screen
分类号:
TN 143; TL 65
DOI:
10.3724/SP.J.1249.2014.02174
文献标志码:
A
摘要:
通过对X射线转换屏制备过程中,Tl+掺杂浓度、基底刻蚀、晶柱生长过程和防潮解等方面的大量实验研究,得到最佳掺杂浓度(摩尔比为0.055%)及合适的基底刻蚀深度(5 μm)与工艺,实现对晶柱生长过程中表面形貌、温度、压力和转速的控制,研制出有效直径为100 mm、空间分辨率约为12 lp/mm(厚度为300 μm)的CsI(Tl) X射线转换屏.
Abstract:
Aimed to obtain a CsI(Tl) X-ray converting screen with high spatial resolution, a lot of experiments have been carried out including Tl+ doping concentrations, etching substrates, and growing crystal columns. It is found that the mole ratio of 0.055% and 5 μm is the best doping concentration and etching depth respectively. Also well controlled are the influence factors for the crystal column growing, such as surface features, temperatures, pressures, and speeds of rotation. The experimental evaluation has shown that a CsI(Tl) X-ray converting screen with spatial resolution of 12 lp/mm (the thickness of 300 μm) and active diameter of 100 mm is developed successfully.

参考文献/References:

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备注/Memo

备注/Memo:
Received:2013-09-13;Revised:2013-11-02;Accepted:2014-01-10
Foundation:National High Technology Research and Development Program of China (2008AA8040071)
Corresponding author:Professor Yang Qinlao. E-mail: qlyang@szu.edu.cn
Citation:Liao Hua, Hu Xin, Yang Qinlao, et al. Experimental study on an X-ray CsI(Tl) converting screen with large format and high spatial resolution[J]. Journal of Shenzhen University Science and Engineering, 2014, 31(2): 174-178.(in Chinese)
基金项目:国家高技术发展计划资助项目(2008AA8040071)
作者简介:廖华(1972-), 男(汉族), 四川省富顺县人, 深圳大学工程师、博士. E-mail: liaoh@szu.edu.cn
引文:廖华,胡昕,杨勤劳, 等. 大面积高分辨率CsI(Tl) X射线转换屏实验研究[J]. 深圳大学学报理工版,2014,31(2):174-178.
更新日期/Last Update: 2014-03-20