[1]奚定平.在室温下用射频等离子体化学蒸汽沉积法沉积类金刚石薄膜[J].深圳大学学报理工版,1991,(1-2):8-12.
 Xi Dingping.Diamond like Carbon (DLC) Film Deposition on Room Temperature Snbstrate Using RF Frequency Plasma Chemical Vapor Deposition Method(PCVD)[J].Journal of Shenzhen University Science and Engineering,1991,(1-2):8-12.
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在室温下用射频等离子体化学蒸汽沉积法沉积类金刚石薄膜()
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《深圳大学学报理工版》[ISSN:1000-2618/CN:44-1401/N]

卷:
期数:
1991年1-2期
页码:
8-12
栏目:
环境与能源
出版日期:
1991-06-30

文章信息/Info

Title:
Diamond like Carbon (DLC) Film Deposition on Room Temperature Snbstrate Using RF Frequency Plasma Chemical Vapor Deposition Method(PCVD)
作者:
奚定平
深圳大学光电工程系
Author(s):
Xi Dingping
Dept of Opto—Electronics
摘要:
本文介绍室温下利用100kHz 频率的等离子体化学蒸汽沉积类金刚石(DLC)薄膜的方法.等离子体形成的气体是氢气(H2)和甲烷(CH4)的混合物.实验成功地在不同的衬底上形成了高质量的类金刚石薄膜。利用红外吸收谱分析了薄膜的结构,对高质量薄膜获得的机理也作了探讨.
Abstract:
This paper reports the deposition of diamondlike carbon (DLC) films on room tem¬perature substrate using 100 kHz RF plasma chemical vapor deposition with hydro¬gen (99%) and methane (1%) mixture. It was found that high quality DLC films could be deposited on various substrates. The properties of the DLC film were discussed from analysis of infrared absorption spectroscopy.
更新日期/Last Update: 2016-05-10