[1]奚定平.在室温下用射频等离子体化学蒸汽沉积法沉积类金刚石薄膜[J].深圳大学学报理工版,1991,(1-2):8-12.
Xi Dingping.Diamond like Carbon (DLC) Film Deposition on Room Temperature Snbstrate Using RF Frequency Plasma Chemical Vapor Deposition Method(PCVD)[J].Journal of Shenzhen University Science and Engineering,1991,(1-2):8-12.
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在室温下用射频等离子体化学蒸汽沉积法沉积类金刚石薄膜(
)
《深圳大学学报理工版》[ISSN:1000-2618/CN:44-1401/N]
- 卷:
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- 期数:
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1991年1-2期
- 页码:
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8-12
- 栏目:
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环境与能源
- 出版日期:
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1991-06-30
文章信息/Info
- Title:
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Diamond like Carbon (DLC) Film Deposition on Room Temperature Snbstrate Using RF Frequency Plasma Chemical Vapor Deposition Method(PCVD)
- 作者:
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奚定平
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深圳大学光电工程系
- Author(s):
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Xi Dingping
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Dept of Opto—Electronics
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- 摘要:
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本文介绍室温下利用100kHz 频率的等离子体化学蒸汽沉积类金刚石（DLC）薄膜的方法.等离子体形成的气体是氢气（H2）和甲烷（CH4）的混合物.实验成功地在不同的衬底上形成了高质量的类金刚石薄膜。利用红外吸收谱分析了薄膜的结构,对高质量薄膜获得的机理也作了探讨.
- Abstract:
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This paper reports the deposition of diamondlike carbon (DLC) films on room tem¬perature substrate using 100 kHz RF plasma chemical vapor deposition with hydro¬gen (99%) and methane (1%) mixture. It was found that high quality DLC films could be deposited on various substrates. The properties of the DLC film were discussed from analysis of infrared absorption spectroscopy.
更新日期/Last Update:
2016-05-10